Finest Rated Dry PTFE Solution Reduces Defectivity in Advanced Lithography Applications.
PORT WASHINGTON, NY. July 9, 2018 – Pall Corporation, a global leader in high-tech filtration, separation, and purification, is pleased to introduce a new filtration solution for use in the semiconductor industry.
The new 5 nm PhotoKleen™ NTD filter -- designed to improve filtration and reduce defects in a variety of advanced lithography applications — will be introduced by Pall Microelectronics at its SEMICON West booth 6143 in San Francisco, July 10-12.
The new filter rated at 5 nm is constructed of ultra-high purity, polytetrafluoroethylene (PTFE) media and perfluoro alkoxy (PFA) hardware materials. PTFE is a high-performance material known for its chemical inertness making it ideal for more aggressive lithography solvents used in more advanced lithography processes including Negative Tone Developer. It offers a significant improvement in pressure drop and cleanliness properties over traditional lithographic filter materials.
“Pall’s lithography filters are known for superior defect reduction capability,” said Michael Mesawich, Vice President of Pall’s Strategic Marketing Group. “The new 5nm PhotoKleen NTD filter is an additional tool for advanced lithographers to use in their defectivity reduction strategies.”
The new 5 nm PhotoKleen NTD filter undergoes the Xpress cleaning process, which results in superior metal, organic and particulate cleanliness, specifically designed for the most advanced patterning chemistries. The combination of the all fluoropolymer construction and the Xpress cleaning, results in one of the cleanest filters available.
To learn more about the new PhotoKleen NTD filter and other Pall Microelectronics technology solutions, please visit https://www.pall.co.in/microelectronics.html
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About Pall Corporation
Pall Corporation is a filtration, separation and purification leader providing solutions to meet the critical fluid management needs of customers across the broad spectrum of life sciences and industry. Pall works with customers to advance health, safety and environmentally responsible technologies. The Company’s engineered products enable process and product innovation and minimize emissions and waste. Pall Corporation serves customers worldwide. For more information, visit www.pall.com.
Corporate Media Contact:
Pall Corporation
Mariann Kourafas
Director, Communications
(508) 871-5469
Technical Contact:
Pall Microelectronics
Michael Mesawich
Vice President, Strategic Marketing for Lithography
Direct Office: (516) 801-9438
Email: michael_mesawich@pall.com